Transparent and scratch-resistant zirconium oxide thin films were deposited in radio-frequency plasma-enhanced chemical vapor deposition process on glass and polycarbonate substrates using zirconium-tetra-tert-butoxide, [Zr(OtBu)4], as the precursor. Investigations on film morphology (AFM), thickness (cross-sectional SEM), phase structure (X-ray diffraction), chemical composition (X-ray photoelectron spectroscopy), and optical properties (UV/Vis, ellipsometry) revealed the interplay of process parameters (plasma power, gas composition, deposition time, and precursor flux) on the composition and properties of the coatings. High-quality transparent coatings (>90%) with a tunable refractive index (n=1.7-2.1) and abrasion-resistant properties were deposited on both polymer and glass substrates. Despite low deposition temperatures (<100°C), the coatings showed good adherence to the substrate and extraordinary barrier properties that were further improved by depositing intermediary SiOx-layers. Phase analysis of the predominantly amorphous films showed the incipient crystallization of ZrO2.
International Journal of Applied Ceramic Technology , 2011, 8 (5), 1050-1058.